The Advanced Research Center for Nanolithography (ARCNL) in Amsterdam Science Park, Netherlands, is inviting applications for a fully funded PhD position focused on generating short-wavelength radiation from plasma. This research sits at the intersection of fundamental physics and industrial application, targeting plasma-based light sources for next-generation extreme-ultraviolet (EUV) nanolithography, which is essential for advanced semiconductor chip manufacturing.

The successful candidate will join the Source Department’s EUV Plasma Processes Group, working on experiments involving high-power lasers, plasma and fluid dynamics, atomic and molecular physics, and data-driven analysis and simulations. The project aims to understand and optimize the emission of EUV radiation (13.5 nm and beyond) from laser-generated plasma, contributing to the development of more efficient and powerful light sources for future lithography machines.

Key responsibilities include designing and running advanced plasma–laser experiments, working with state-of-the-art droplet generators and laser systems, analyzing light and ion emission from plasma, collaborating with theory teams using radiation-hydrodynamics simulations, and presenting research at international conferences. The research environment is highly interdisciplinary and collaborative, with opportunities to work alongside other PhD students, postdocs, and industrial partners such as ASML.

Applicants should have or be about to obtain an MSc in (Applied) Physics. Experience in laser physics, plasma physics, or fluid mechanics is advantageous, especially with strong hands-on laboratory skills. Programming skills (especially Python) and excellent English communication abilities are also valued. The position is fully funded, offering a starting salary of €2,968 gross per month (with annual increases), a high-end laptop, housing and visa support for international candidates, relocation and transport compensation, and dedicated PhD training courses. The PhD degree will be awarded by a Dutch university.

ARCNL is a world-leading research institute supported by the Dutch Research Council (NWO), University of Amsterdam, Vrije Universiteit Amsterdam, University of Groningen, and ASML. The institute is committed to diversity and inclusion, encouraging applications from candidates of all backgrounds, genders, and nationalities.

To apply, submit your CV and a motivation letter (max. 1 page) online. There is no fixed deadline; the vacancy remains open until filled, with the first shortlist expected in December 2025. For more information, contact Dr. Oscar Versolato ([email protected]).