Postdoctoral Researcher in Carbide Thin Films, Atmospheric Pressure Plasma Processing, and Materials Characterization University of Kentucky in United States

The Hovish Research Lab at the University of Kentucky is recruiting a Postdoctoral Researcher for work on carbide film deposition from colloidal feedstocks using atmospheric pressure plasma processing. The project is aimed at developing advanced materials for extreme aerothermal environments and contributing to a growing research program in advanced thin film materials.

The postdoctoral researcher will help develop plasma-enabled synthesis approaches, establish structure–processing relationships, and support research at the intersection of materials science, chemical engineering, physics, and chemistry. Relevant technical experience includes atmospheric pressure plasma processing, nanoparticle or colloidal solution processing, and materials characterization methods such as spectroscopy, microscopy, and diffraction.

This is a one-year postdoctoral appointment expected to begin in Fall 2026, with the possibility of renewal based on performance and project success. The post does not mention a formal application portal or funding package, so interested candidates should contact the PI directly by email.

Contact: Michael Q. Hovish, University of Kentucky, [email protected]