L. Stafford
University Name
Canada
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Research Interests
Materials Chemistry
70%
Physical Chemistry
20%
Thin Film Deposition
60%
Magnetron Sputtering
40%
Spark Plasma Sintering
30%
Coating Technology
30%
Plasma Physics
20%
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Articles11
Collaborators7
Nicolas Naudé
Associate Professor
Université de Toulouse
FRANCE
jacopo profili
Research Professional
CHU de Québec-Université Laval
CANADA
Ahmad Hamdan
Assistant Professor
Université de Montréal
CANADA
Anne-Françoise Mingotaud
CNRS Délégation Midi-Pyrénées
FRANCE
Richard Clergereaux
Université de Toulouse
FRANCE
Myrtil L. Kahn
Université de Toulouse
FRANCE
Sylvain Coulombe
Professor
McGill University
CANADA
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