Beyond Extreme Ultraviolet Light Source Plasmas: Theory and Experiment Advanced Research Center for Nanolithography ARCNL in Netherlands

This fully funded PhD position at the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam, The Netherlands, offers an exciting opportunity to work at the intersection of fundamental physics and industrial application. The project is embedded within ARCNL’s Source Department, which focuses on atomic- and molecular-level understanding of plasma-based sources for extreme-ultraviolet (EUV) and beyond-EUV light, crucial for next-generation nanolithography and semiconductor manufacturing.

The research group has made significant contributions to the field, including uncovering the quantum origins of EUV light, establishing universal laws for expanding plasma, and developing alternative EUV source solutions. The current project aims to elucidate the properties of plasmas that radiate at wavelengths even shorter than 13.5 nm, with potential applications in future nanolithography, metrology, and biological imaging.

As a PhD student, you will engage in both experimental and theoretical work, designing and executing experiments, working with advanced laser technologies, and performing numerical modeling to quantify plasma radiative properties, ion production, and photon conversion efficiency. You will join a dynamic, interdisciplinary team of PhD students and postdocs in a highly collaborative environment, with strong ties to the semiconductor industry through ARCNL’s partnership with ASML.

The position is a full-time, four-year appointment with a starting salary of €3,115 per month and comprehensive employment benefits. ARCNL provides support for international students, including assistance with housing, visa applications, and compensation for transport and furnishing expenses. Upon successful completion, a PhD degree will be awarded by a Dutch university. The institute is located at Amsterdam Science Park and offers a vibrant, international research community.

Applicants should hold or be about to obtain an MSc in (Applied) Physics, with knowledge of experimental atomic, plasma, or laser physics and strong laboratory skills. Programming experience (especially Python) and excellent English communication skills are desirable. ARCNL is committed to diversity and encourages applications from candidates of all backgrounds.

For more information, contact Dr. John Sheil at [email protected]. Apply online via the provided link before the deadline of April 15, 2026.