PhD Position: Area-Selective Atomic Layer Deposition for Next-Generation Semiconductors Leibniz Institute for Solid State and Materials Research Dresden in Germany

The Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden) is a leading research institution dedicated to the development of innovative and sustainable materials and technologies. With a diverse team of over 500 employees from more than 40 nations, IFW Dresden fosters a collaborative and international research environment, supporting young scientists and engineers in their career development.

The Institute for Materials Chemistry, under the direction of Prof. Dr. Anjana Devi, is offering a PhD position in the Nanostructured Thin Film Materials group. The research topic focuses on 'Area-Selective Atomic Layer Deposition for Next-Generation Semiconductors.' The position is part-time (26.8 hours per week, 67% FTE) and will commence on August 1, 2026. The initial contract is for 12 months, with the possibility of extension for an additional 24 months.

The main research tasks include developing atomic layer deposition (ALD) and area-selective deposition (ASD) processes for advanced semiconductor applications. The project involves fabricating functional metal and oxide thin films, optimizing surface chemistry, inhibitors, and growth conditions for selective deposition. Characterization of deposited films and selective growth behavior will be performed using advanced analytical techniques such as XPS, SEM, AFM, XRD, Raman spectroscopy, ellipsometry, and electrical measurements. The goal is to understand surface chemistry, nucleation mechanisms, and structure–property relationships in memristor devices.

Applicants should have an M.Sc. degree in materials science, chemistry, physics, or a related field. Essential qualifications include knowledge of thin-film fabrication techniques (especially ALD, CVD, or related methods), experience in surface chemistry, nanomaterials, and thin-film characterization. Strong communication skills in English, the ability to present scientific results clearly, and a collaborative spirit are required. The research environment is highly interdisciplinary, involving postdoctoral researchers, PhD students, and technical staff from inorganic chemistry, materials chemistry, and materials science and engineering.

IFW Dresden offers a modern, well-equipped workplace on the campus of Technische Universität Dresden, flexible and family-friendly working hours, 30 days of vacation per year, a company pension scheme (VBL), job ticket/Germany ticket benefits, special annual payment, capital-forming benefits, company health management, discounted sports offers from the Dresden University Sports Center, further training opportunities, and a company restaurant. The contract and remuneration are based on the TV-L EG 13 collective bargaining law for the public service of the federal states.

Applications from qualified women and individuals with severe disabilities are strongly encouraged. Proof of disability status must be included if applicable. To apply, submit your application as a single PDF file (including CV, list of publications, motivation letter, certificates, and contact details for at least two professional references) citing reference number 038-26-3500 by email to [email protected] by May 31, 2026. For further information, contact Prof. Dr. Anjana Devi or Dr. Harish Parala at [email protected]. More details and the application link can be found at the Leibniz Gemeinschaft careers page.