The George Washington University, in partnership with the National Institute of Standards and Technology (NIST) through the Professional Research Experience Program (PREP), is offering a postdoctoral fellowship focused on advancing semiconductor metrology. The successful candidate will join the Material Measurement Laboratory in Gaithersburg, MD, contributing to the NIST/CHIPS Nanometer-Scale Planar Reference Materials project. This research is at the forefront of characterizing the physical and chemical properties of nanometer-scale thin films on silicon (Si) and silicon carbide (SiC) wafers, supporting the development of hybrid metrology and digital wafers for the semiconductor industry.

Key responsibilities include conducting research using lab-based and synchrotron X-ray characterization techniques (XRR, XRF, or XPS), developing structural models and hybrid metrology maps with open-source Python fitting methods, and managing wafer dicing, cleaning, and packaging for research-grade test materials. The fellow will also be expected to publish in high-impact journals and present at international conferences.

Applicants should have a Ph.D. in Physics, Materials Science, or a related field, with a strong background in X-ray measurement techniques. Experience in Python-based data modeling and fitting is essential, and familiarity with thin-film deposition and cleanroom protocols is highly preferred. The position requires eligibility for a Department of Commerce background check for facility access.

This opportunity allows the fellow to contribute to the CHIPS Act mission and collaborate with leading NIST scientists in a state-of-the-art laboratory environment. The position is based at the NIST campus in Gaithersburg, Maryland, and is funded through the NIST PREP program. For more information and to apply, visit the provided application link.