Advanced Research Center for Nanolithography (ARCNL)
3 months ago
PhD: High-Harmonic Generation and Spectroscopy of Liquids and Few-layer Solids Advanced Research Center for Nanolithography ARCNL in Netherlands
Degree Level
PhD
Field of study
Chemistry
Funding
Full funding availableDeadline
December 31, 2026Country
Netherlands
University
Advanced Research Center for Nanolithography (ARCNL)

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About this position
This fully funded PhD position at the Advanced Research Center for Nanolithography (ARCNL) offers an exciting opportunity to work at the intersection of fundamental physics and advanced spectroscopy. The research focuses on high-harmonic generation (HHG) and ultrafast spectroscopy to investigate the dynamics of liquids and few-layer solids. As a member of the Short Wavelength Light Sources for EUV Metrology group, you will design and build beamlines for HHG sources, conduct experiments with ultrafast laser systems, develop spectroscopic and interferometric methods, and analyze large datasets to reveal the mechanisms of light emission and structural dynamics at femtosecond to attosecond timescales.
The group, led by Dr. Angana Mondal, is pioneering the use of liquid-phase HHG and ultrafast spectroscopy to create designable coherent EUV and soft X-ray sources. Unlike traditional HHG sources generated in gases or crystalline solids, the group explores novel materials such as liquids and 2D solids to overcome limitations in photon energy, brilliance, and damage thresholds. Dr. Mondal’s research has established fundamental principles of HHG in liquids and demonstrated multi-plateau HHG driven by off-site recombination, with publications in leading journals such as Nature Physics and Nature Photonics.
The project aims to develop tailored EUV and soft X-ray sources by uncovering ultrafast mechanisms of light–matter interaction and implementing new control strategies involving geometry, composition, field parameters, and phase-retrieval techniques. The long-term vision is to apply these sources in imaging and metrology for semiconductor materials and interfaces, combining ultrafast temporal resolution with nanoscale spatial sensitivity.
ARCNL is located at Amsterdam Science Park and performs fundamental research in physics and chemistry relevant to nanolithography, closely connected to the interests of industrial partner ASML. The institute employs about 100 people, including 65 researchers from diverse backgrounds. The PhD position is a full-time appointment for four years, with a starting salary of €3,115 per month and a range of employment benefits. Foreign PhD students receive assistance with housing, visa applications, transport costs, and furnishing expenses. Upon successful completion, a PhD degree will be granted at a Dutch university, and several courses are offered specifically for PhD students.
Applicants must hold, or be nearing completion of, a Master’s degree in Physics, Physical Chemistry, Materials Science, or a closely related discipline. Strong interest in nonlinear optics, materials science, and chemistry is required, along with excellent critical thinking and innovative problem-solving skills. Proficiency in English is mandatory. Experience with femtosecond lasers is advantageous but not required. Preferred skills include programming (Python, MATLAB), large data handling, vacuum systems, EUV/X-ray instrumentation, and knowledge of HHG or laser-matter interaction.
ARCNL is committed to diversity and inclusion, recruiting based on competencies and talents. Applications are encouraged from candidates of all backgrounds. For more information, contact Dr. Angana Mondal at [email protected]. Apply online via the provided link before the deadline of August 31, 2026.
Funding details
Full funding including tuition fees and living expenses is available for this position. The scholarship covers all educational costs and provides a monthly stipend.
How to apply
Please submit your application including a cover letter, CV, academic transcripts, and contact information for two references. Applications should be sent via the online portal before the deadline.
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