Postdoctoral Research Position in Plasma–Thin Film Interactions for EUV Lithography and Nanotechnology University of Twente in Netherlands

Postdoctoral research position at the University of Twente in Enschede, Netherlands, focused on plasma–thin film interactions, especially the interaction of hydrogen plasma with thin films for EUV lithography, plasma-surface science, and nanotechnology applications.

The project is embedded in the XUV Optics Group within the MESA+ Institute for Nanotechnology. The work involves advanced in situ experiments, thin-film model system design and preparation, hydrogen uptake and transport studies, and data analysis using neutron reflectometry. The project is carried out in collaboration with the Technical University Delft and industrial partners including Zeiss, ASML, Malvern Panalytical, and VDL.

Eligible applicants should have a PhD in Physics, Materials Science, or Physical Chemistry, or expect to obtain the degree soon. Helpful experience includes plasma or ion-beam interactions with surfaces, PVD thin films, surface physics/chemistry, and advanced characterization methods such as neutron or X-ray reflectometry. Strong English skills, teamwork, creativity, and motivation for collaborative research are emphasized.

The appointment is for 1 year, full-time (38–40 hours/week). Salary is €4,241–€5,538 gross per month, plus holiday allowance, year-end bonus, pension, leave hours, and access to campus sports and development support.

Deadline: 13 July 2026. Apply through the university vacancy portal and submit a CV, motivation letter, and/or publication list, plus references and proof of English proficiency if available.