Postdoctoral Research Position in Plasma–Thin Film Interactions for EUV Lithography and Nanotechnology
Postdoctoral research position at the
University of Twente
in Enschede, Netherlands, focused on
plasma–thin film interactions
, especially the interaction of
hydrogen plasma
with thin films for
EUV lithography
, plasma-surface science, and nanotechnology applications.
The project is embedded in the
XUV Optics Group
within the
MESA+ Institute for Nanotechnology
. The work involves advanced
in situ experiments
, thin-film model system design and preparation, hydrogen uptake and transport studies, and data analysis using
neutron reflectometry
. The project is carried out in collaboration with the
Technical University Delft
and industrial partners including
Zeiss
,
ASML
,
Malvern Panalytical
, and
VDL
.
Eligible applicants should have a PhD in
Physics
,
Materials Science
, or
Physical Chemistry
, or expect to obtain the degree soon. Helpful experience includes plasma or ion-beam interactions with surfaces,
PVD thin films
, surface physics/chemistry, and advanced characterization methods such as neutron or X-ray reflectometry. Strong English skills, teamwork, creativity, and motivation for collaborative research are emphasized.
The appointment is for
1 year
, full-time (38–40 hours/week). Salary is
€4,241–€5,538 gross per month
, plus holiday allowance, year-end bonus, pension, leave hours, and access to campus sports and development support.
Deadline:
13 July 2026. Apply through the university vacancy portal and submit a CV, motivation letter, and/or publication list, plus references and proof of English proficiency if available.