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Researcher position in plasma etching for III-V lasers and silicon photonic integration CNRS in France
Degree Level
not provided
Field of study
Electrical Engineering
Funding
Temporary full-time research position funded within the IRT Nanoelec project; not funded by an EU programme. The post is a 35-hour-per-week contract starting 1 Jan 2027. No stipend or salary amount is stated.
Deadline
Oct 9, 2026
Country
France
University
CNRS

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About this position
Researcher position at CNRS in Grenoble, France, focused on plasma etching for III-V lasers and silicon photonic integration.
The project is carried out within the framework of IRT Nanoelec and aims to develop a 300 mm CMOS-compatible integrated photonics platform. The main scientific challenge is the plasma patterning of a complex III-V semiconductor stack, with emphasis on selective etch stopping on an InP contact layer and achieving anisotropic sidewalls without damaging the quantum wells.
The work will be conducted at the Laboratoire des Technologies de la Microélectronique (LTM), a joint CNRS and Université Grenoble Alpes laboratory located at the CEA-LETI-MINATEC site. The candidate will work with the PROSPECT team and collaborate closely with CEA/Leti. Access is provided to a 300 mm etching reactor with pulsed plasma technology and to characterization tools such as ellipsometry, XPS, AFM, FIB-STEM, and EDX.
Requirements include a PhD or equivalent in Engineering, Physics, or Technology, plus 1-4 years of research experience. Technical experience in plasma/wet etching and materials characterization is requested, along with English and basic French; Python is listed as an additional skill.
This is a temporary full-time research contract starting 1 Jan 2027. The application deadline is 9 Oct 2026. Apply via the CNRS recruitment website; an Euraxess page is also provided for additional details.
Funding details
Temporary full-time research position funded within the IRT Nanoelec project; not funded by an EU programme. The post is a 35-hour-per-week contract starting 1 Jan 2027. No stipend or salary amount is stated.
What's required
PhD or equivalent in Engineering, Physics, or Technology. 1-4 years of research experience is requested. Technical skills required include plasma etching and wet etching processes and material characterization using XPS, ellipsometry, AFM, and electron microscopy. Additional skills include written and spoken English and Python programming. Basic French is listed as the language level.
How to apply
Apply through the CNRS job portal using the provided website link. A direct Euraxess application page is also listed for more details. Submit before the deadline.
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