Charles Winter

Professor

Wayne State University

United States

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Professor Charles Winter is a faculty member at Wayne State University in the United States. His research focuses on advanced materials and deposition techniques, including atomic layer deposition and low-k dielectrics, as evidenced by his recent publications. Professor Winter’s work explores novel methods for the synthesis of films and interconnects, contributing significantly to the fields of materials science and engineering.

Articles (10)

Year:

2025

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2025

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2023

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2023

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2023

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2021

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2021

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2020

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2020

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2020

Collaborators (3)

Xiaobing Hu

Research Assistant Professor

Northwestern University

UNITED STATES

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Jit Dutta

University of California, San Diego

UNITED STATES

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Andrew Kummel

University of California

UNITED STATES

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Charles Winter

Research Interests

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Articles (10)

Vapor-Deposited MOF for Low-k Dielectric Seamless High-Aspect-Ratio Interconnect Gap Fill

Air-Stable Low Dielectric Constant SiOx/AlOx Nanolaminate Films Deposited by Thermal Pulsed Chemical Vapor Deposition with Continuous Carbon Doping For Interlayer Dielectric

Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces

Thermal atomic layer deposition of Er2O3 films from a volatile, thermally stable enaminolate precursor

Low-<i>k</i> SiO<sub><i>x</i></sub>/AlO<sub><i>x</i></sub> Nanolaminate Dielectric on Dielectric Achieved by Hybrid Pulsed Chemical Vapor Deposition

Evaluation of Volatility and Thermal Stability in Monomeric and Dimeric Lanthanide(III) Complexes Containing Enaminolate Ligands

Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium

Cu–Cu Bonding Using Selective Cobalt Atomic Layer Deposition for 2.5-D/3-D Chip Integration Technologies

A Volatile Dialane Complex from Ring Expansion of an N-Heterocyclic Carbene and Its Use in the Thermal Atomic Layer Deposition of Aluminum Metal Films

Thermal atomic layer deposition of ruthenium metal thin films using nonoxidative coreactants

Collaborators (3)

Xiaobing Hu

Jit Dutta

Andrew Kummel

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