Claudia Bock at microsystems technology ruhr‐university bochum universitätsstr. 150 44801 bochum germany - Research Interests, Publications & Academic Profile - ApplyKite

Claudia Bock

University Name

Germany

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Research Interests

Materials Chemistry

80%

Inorganic Chemistry

60%

Thin Film Deposition

80%

Molecular Beam Epitaxy

70%

Metal Chemistry

40%

Photoelectrocatalysis

40%

Lanthanide Chemistry

30%

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Articles10

Wafer‐Scale Demonstration of Polycrystalline MoS2 Growth on 200 mm Glass and SiO2/Si Substrates by Plasma‐Enhanced Atomic Layer Deposition

Year:

2024

Ultrashort‐Pulsed‐Laser Annealing of Amorphous Atomic‐Layer‐Deposited MoS<sub>2</sub> Films

Year:

2023

Nucleation and growth studies of large-area deposited WS2 on flexible substrates

Year:

2022

Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction

Year:

2022

Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application

Year:

2022

Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low-Resistivity Co Thin Films

Year:

2021

A study on the influence of ligand variation on formamidinate complexes of yttrium: new precursors for atomic layer deposition of yttrium oxide

Year:

2021

A study on the influence of ligand variation on formamidinate complexes of yttrium: new precursors for atomic layer deposition of yttrium oxide

Year:

2021

Atomic layer deposition of dielectric Y2O3 thin films from a homoleptic yttrium formamidinate precursor and water

Year:

2021

From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

Year:

2020

Collaborators2

Anjana Devi

Ruhr-Universität Bochum

GERMANY

Andreas Ostendorf

-

GERMANY

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