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Hanchen Liu

Aalto University

Finland

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Research Interests

Materials Chemistry

50%

Hardware Engineering

20%

Silicon Photonics

30%

Thin Film Deposition

30%

Magnetron Sputtering

30%

Thin Film Technology

20%

Photodetector Technology

20%

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Articles6

Efficient surface passivation of germanium nanostructures with 1% reflectance

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Year:

2023

Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions

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Year:

2023

Plasma-enhanced atomic layer deposited SiO2 enables positive thin film charge and surface recombination velocity of 1.3 cm/s on germanium

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Year:

2023

Surface Passivation of Germanium with ALD Al2O3: Impact of Composition and Crystallinity of GeOx Interlayer

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Year:

2023

Comparison of SiNx-based Surface Passivation Between Germanium and Silicon

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Year:

2023

Achieving surface recombination velocity below 10 cm/s in n-type germanium using ALD Al2O3

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Year:

2021

Collaborators6

Oskari Leiviskä

Aalto University

FINLAND

Ville Vähänissi

Aalto University

FINLAND

Kalevi Kokko

Professor Emeritus

University of Turku

FINLAND

Zahra Sadat Jahanshah Rad

University of Turku

FINLAND

Hele Savin

Aalto University

FINLAND

Joonas Isometsä

Aalto University

FINLAND

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