Kosuke Tachibana
Has grant
Assistant Professor
JapanResearch Interests
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About
Dr. Kosuke Tachibana is an Assistant Professor at Oita University in Japan. His research primarily focuses on plasma technology, particularly in applications involving carbon sulfonation and water treatment processes. He has contributed to understanding chemical reactions induced by plasma in various contexts and has developed innovative plasma reactors. His recent publications explore the mechanisms of plasma interactions with liquids and the characteristics of corona discharge in atmospheric conditions.
Recent Grants
Grant: Close
プラズマ医療の安全性確立へ向けたプラズマ誘起界面反応のメカニズム解明
Open Date: 2019-04-01
Close Date: 2022-03-01
Grant: Close
広域反応場を有する気液界面プラズマを用いた難分解性汚染水の高速処理
Open Date: 2015-04-01
Close Date: 2018-03-01
Articles (7)
Year:
2024
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2023
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2022
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2022
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2020
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2020
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2020
Collaborators (3)
Marek Kocik
Institute of Fluid Flow Machinery
Nozomi Takeuchi
Associate Professor
Tokyo Institute of Technology
Jerzy Mizeraczyk
Professor
Gdynia Maritime University
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