Krzysztof Zdunek

Professor

University of Warsaw

Poland

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Professor Krzysztof Zdunek is a faculty member at Warsaw University of Technology in Poland. His research primarily focuses on advanced coating techniques and materials science, as evidenced by his recent publications on topics such as oxygen vacancy control in HfxTi1-xO2 layers, intermetallic compound layers for micro-bump array fabrication, and various synthesis methods of amorphous carbon thin films. Professor Zdunek's work contributes significantly to the fields of magnetron sputtering and the development of thin film technologies.

Articles (17)

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2025

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2024

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2023

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2023

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2023

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2022

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2022

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2022

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2022

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2022

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2021

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2020

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2020

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2020

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2020

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2020

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2020

Collaborators (12)

Marek Trzcinski

Bydgoszcz University of Science and Technology

POLAND

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Łukasz Skowroński

Bydgoszcz University of Science and Technology

POLAND

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Katarzyna Mulewska

National Centre for Nuclear Research

POLAND

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Roman Minikayev

Institute of Physics, Polish Academy of Sciences

POLAND

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M. Nadolski

Częstochowa University of Technology

POLAND

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Grzegorz Greczynski

Professor

Linköpings universitet Tekniska högskolan

SWEDEN

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Artur Lachowski

Institute of High Pressure Physics

POLAND

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Grzegorz Stradomski

profesor nadzwyczajny (dr hab. inż. Prof. PCz)

Politechnika Wroclawska

POLAND

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Robert Szczęsny

Nicolaus Copernicus University

POLAND

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Svitlana Romaniuk

Assistant professor

National Centre for Nuclear Research

POLAND

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Katarzyna Nowakowska-Langier

National Centre for Nuclear Research

POLAND

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Jakub Jaroszewicz

University of Warsaw

POLAND

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Krzysztof Zdunek

Research Interests

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About

Articles (17)

The growth of oxygen vacancy controlled HfxTi1-xO2 layers deposited by gas injection magnetron sputtering technique

Intermetallic compound layer formation in indium-based micro-bump array fabrication technology for IR detectors

Carbon ion self–sputtering attained by sublimation of hot graphite target and controlled by pulse injection of a neon–helium gas mixture

The Amorphous Carbon Thin Films Synthesized by Gas Injection Magnetron Sputtering Technique in Various Gas Atmospheres

Optical Properties of Amorphous Carbon Thin Films Fabricated Using a High-Energy-Impulse Magnetron-Sputtering Technique

Multi-component low and high entropy metallic coatings synthesized by pulsed magnetron sputtering

The sputtering of titanium magnetron target with increased temperature in reactive atmosphere by gas injection magnetron sputtering technique

Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering technique

On the Control of Hot Nickel Target Magnetron Sputtering by Distribution of Power Pulses

Design of thin DLC/TiO2 film interference coatings on glass screen protector using a neon–argon-based gas injection magnetron sputtering technique

Synthesis of Copper Nitride Layers by the Pulsed Magnetron Sputtering Method Carried out under Various Operating Conditions

Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputtering

Physical modelling of the production of an alloy vapour source for the synthesis of dielectric material

Design of pulsed neon injection in the synthesis of W-B-C films using magnetron sputtering from a surface-sintered single powder cathode

Influence of generation control of the magnetron plasma on structure and properties of copper nitride layers

The state of coating–substrate interfacial region formed during TiO<inf>2</inf> coating deposition by Gas Injection Magnetron Sputtering technique

TiO<inf>2</inf> - based decorative interference coatings produced at industrial conditions

Collaborators (12)

Marek Trzcinski

Łukasz Skowroński

Katarzyna Mulewska

Roman Minikayev

M. Nadolski

Grzegorz Greczynski

Artur Lachowski

Grzegorz Stradomski

Robert Szczęsny

Svitlana Romaniuk

Katarzyna Nowakowska-Langier

Jakub Jaroszewicz

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