Markku Leskela

University of Helsinki

Finland

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Articles (17)

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2025

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2025

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2024

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2023

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2023

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2023

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2023

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2023

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2023

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2023

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2022

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2022

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2022

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2022

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2021

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2021

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2021

Collaborators (14)

Marianna Kemell

University of Helsinki

FINLAND

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Timo Hatanpää

University of Helsinki

FINLAND

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Alexander Weiß

University of Helsinki

FINLAND

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Kenichiro Mizohata

University of Helsinki

FINLAND

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Mikko Heikkilä

University of Helsinki

FINLAND

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Guillermo Vinuesa

Associate Professor

Universidad de Valladolid Escuela de Ingenierías Industriales

SPAIN

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Miia Mäntymäki

University lecturer

University of Helsinki

FINLAND

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Ville Lovikka

University of Helsinki

FINLAND

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Miika Mattinen

University of Helsinki

FINLAND

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Matti Putkonen

University of Helsinki

FINLAND

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Xinzhi Li

University of Helsinki

FINLAND

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Pasi Jalkanen

University of Helsinki

FINLAND

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Georgi Popov

University of Helsinki

FINLAND

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Mikko Ritala

University of Helsinki

FINLAND

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Markku Leskela

Research Interests

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Articles (17)

Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability

Recent trends in thermal atomic layer deposition chemistry

Atomic Layer Deposition of ScF3 and ScxAl yFz Thin Films

Conversion of ALD CuO Thin Films into Transparent Conductive p-Type CuI Thin Films

Atomic Layer Deposition of Boron-Doped Al2O3 Dielectric Films

Molecular Layer Deposition of Pyrrone Thin Films by Oxidative Polymerization

Atomic layer deposition of CoF2, NiF2 and HoF3 thin films

Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3

Molecular layer deposition of hybrid silphenylene-based dielectric film

Inherent Area-Selective Atomic Layer Deposition of ZnS

Toposelective vapor deposition of hybrid and inorganic materials inside nanocavities by polymeric templating and vapor phase infiltration

Atomic layer deposition of PbCl2, PbBr2 and mixed lead halide (Cl, Br, I) PbXnY2-n thin films

Atomic Layer Deposition of CsI and CsPbI3

Atomic layer deposition of GdF3 thin films

Highly conductive and stable Co9S8 thin films by atomic layer deposition

Analysis of the performance of Nb2O5-doped SiO2-based MIM devices for memory and neural computation applications

Self-Aligned Thin-Film Patterning by Area-Selective Etching of Polymers

Collaborators (14)

Marianna Kemell

Timo Hatanpää

Alexander Weiß

Kenichiro Mizohata

Mikko Heikkilä

Guillermo Vinuesa

Miia Mäntymäki

Ville Lovikka

Miika Mattinen

Matti Putkonen

Xinzhi Li

Pasi Jalkanen

Georgi Popov

Mikko Ritala

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