Oddur Ingólfsson

Iceland

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Articles (13)

Year:

2025

Year:

2024

Low energy electron-induced fragmentation of 2-(trifluoromethyl)acrylic acid a potential component of extreme ultraviolet lithography resist materials.

Year:

2023

Year:

2023

Year:

2023

Year:

2023

Year:

2023

Year:

2022

Year:

2021

Year:

2021

Year:

2021

Year:

2020

Year:

2020

Collaborators (6)

Filipe Ferreira da Silva

Universidade de Aveiro

PORTUGAL

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Lisa McElwee-White

University of Florida

UNITED STATES

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Lionel Amiaud

Associated Professeur

Université Paris-Saclay Faculté des Sciences d'Orsay

FRANCE

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Maria José Calhorda

Universidade de Aveiro

PORTUGAL

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Anne Lafosse

FRANCE

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Adrià Gil

Faculdade de Ciências da Universidade de Lisboa

PORTUGAL

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Oddur Ingólfsson

Research Interests

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Articles (13)

Revisiting CN− Formation Mechanisms in Electron Collisions with Benzonitrile

Experimental and Theoretical Study on Electron Ionization and Fragmentation of Propylene Oxide─the First Chiral Molecule Detected in the Interstellar Medium

Low-energy electron interaction with 2-(trifluoromethyl)acrylic acid, a potential component for EUVL resist material

Dissociative electron attachment and dissociative ionization of CF3AuCNC(CH3)3, a potential FEBID precursor for gold deposition

Potential of HF and CO2 loss through dissociative electron attachment to increase radiosensitizers reactivity; case study on pentafluorobenzoic acid

Low-energy electron interaction with 2-(trifluoromethyl)acrylic acid, a potential component for EUVL resist material

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH3)2Cl]2

Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition

Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

Electron-Transfer-Induced Side-Chain Cleavage in Tryptophan Facilitated through Potassium-Induced Transition-State Stabilization in the Gas Phase

Electron-Induced Reactions of Ru(CO)4I2: Gas Phase, Surface, and Electron Beam-Induced Deposition

Dissociation of the FEBID precursor cis-Pt(CO)2Cl2 driven by low-energy electrons

Collaborators (6)

Filipe Ferreira da Silva

Lisa McElwee-White

Lionel Amiaud

Maria José Calhorda

Anne Lafosse

Adrià Gil

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