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Oleg Kostko

Scientist

Lawrence Berkeley National Laboratory

United States

Research Interests

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Articles (20)

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Collaborators (11)

D. Howard Fairbrother

UNITED STATES

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Michael Tsapatsis

Professor

Johns Hopkins University

UNITED STATES

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Eric Gullikson

Staff Scientist

Lawrence Berkeley National Laboratory

UNITED STATES

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B. von Issendorff

University of Freiburg

GERMANY

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amine cassimi

Normandie Université

FRANCE

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Mark H. Thiemens

UNITED STATES

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Kumar Varoon Agrawal

GAZNAT Chair & Associate Professor

École Polytechnique Fédérale de Lausanne

SWITZERLAND

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Dahyun Oh

Associate Professor

San Jose State University

UNITED STATES

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Joseph T. Hupp

Northwestern University

UNITED STATES

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Giulio D'Acunto

Eindhoven University of Technology

NETHERLANDS

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Stacey F. Bent

Stanford University

UNITED STATES

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Oleg Kostko

Research Interests

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Articles (20)

Unveiling chemical heterogeneity in underlayer materials via resonant soft X-ray reflectivity

Revealing Structure-Driven Performance of Molecular-Atomic Layer Deposited Resists for Extreme Ultraviolet Lithography through In Situ Analysis

High-throughput analysis of total electron yield and outgassing under EUV exposure for accelerated photoresist materials discovery

Structural motifs of gold cluster anions with 17 to 69 atoms

Effect of Networking Density on the Patterning Performance of Molecular Layer Deposited Alucone Electron Beam/EUV Resists

Photoselective isotope fractionation dynamics of N 2 with cosmo and atmospheric chemistry perspectives

Publisher Correction: Spin-on deposition of amorphous zeolitic imidazolate framework films for lithography applications

Spin-on deposition of amorphous zeolitic imidazolate framework films for lithography applications

Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography Using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition

High-precision monitoring of outgassing species in model extreme ultraviolet photoresists with a cavity ring-down spectrometer

Bismuth-oxo Clusters for Next Generation Extreme Ultraviolet Light Photolithography

Extreme ultraviolet induced chemistry in polymer thin films

High precision monitoring of outgassing species in model EUV photoresists with a cavity ring-down spectrometer

Polypeptoids as promising EUV photoresists: A study of total electron yield and outgassing under EUV exposure

State selectivity in core ionization of methane

Understanding the role of underlayers in enhancing EUV resist sensitivity

A Vacuum Ultraviolet Photoionization Mass Spectrometry and Density Functional Calculation Study of Formic Acid-Water Clusters

Evaluation of Electron Blur for Different Electron Energies

Experimental characterization of model extreme ultraviolet resist materials

Exploring the impact of electron affinity on the electron emission in EUV photolithography

Collaborators (11)

D. Howard Fairbrother

Michael Tsapatsis

Eric Gullikson

B. von Issendorff

amine cassimi

Mark H. Thiemens

Kumar Varoon Agrawal

Dahyun Oh

Joseph T. Hupp

Giulio D'Acunto

Stacey F. Bent

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