Shinji Yamakawa

Assistant professor

University of Hyogo

Japan

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Shinji Yamakawa is an Assistant Professor at the University of Hyogo, Japan. His research focuses on polymerization processes, specifically involving transition metal complexes, and advanced lithography techniques including EUV and X-ray absorption spectroscopy. Recent publications highlight his work on the characterization of thin films and the spatial distribution of functional groups and polymers in resist materials.

Articles (20)

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2025

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2024

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2024

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2024

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2023

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2023

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2021

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2021

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2020

Collaborators (1)

Daisuke Takeuchi

Professor

Hirosaki University

JAPAN

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Shinji Yamakawa

Research Interests

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Articles (20)

Polymerization of 1,3-butadiene catalyzed by Co(ii) and Ni(ii) complexes of 6,6′-dihydroxy-2,2′-bipyridine ligands: 1,4-cis-polymerization versus isospecific 1,2-polymerization

Current Status of EUV Flood Exposure Tool at NewSUBARU BL03

Observation Result of Chemical Composition Distribution of Resist Thin Film by Photoemission Electron Microscopy

Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering

Comparison of photoresist sensitivity between KrF, EB, and EUV exposure

The x-ray absorption spectroscopy analysis of the negative-tone PAG bound resist

Carbon/boron multilayer for beyond EUV lithography

Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU

Present Status of EUV Interference Lithography at NewSUBARU

Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering

Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope

Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure

Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement

Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist

Hydrogen damage and cleaning evaluation of Mo/Si multilayer using high-power EUV irradiation tool

Beyond EUV measurement at NewSUBARU synchrotron light facility

Development of a high-power EUV irradiation tool in a hydrogen atmosphere

Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement

Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility

Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System

Collaborators (1)

Daisuke Takeuchi

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