Takumi Ikenoue

Assistant Professor

Kyoto University

Japan

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Takumi Ikenoue is an Assistant Professor at Kyoto University in Japan. His research areas include electrochemical processes for aluminum electrodeposition, interface quality in metal contacts for β-Ga2O3, and fabrication techniques for thin films such as vanadium dioxide and V2O3. He has published recent articles exploring the effects of additives in electrodeposition, the growth of oxide films, and innovative methods for material fabrication.

Articles (21)

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2025

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2022

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2020

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2020

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2020

Collaborators (5)

Toshiya Doi

教授 / Professor

Kyoto University

JAPAN

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Tetsuji Hirato

Kyoto University

JAPAN

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Masao Miyake

Kyoto University

JAPAN

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Cameron Gorsak

Cornell University

UNITED STATES

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Masakazu Tane

Professor

Osaka University

JAPAN

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Takumi Ikenoue

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Articles (21)

Effects of Electrochemical Oxygen Reduction on Aluminum Electrodeposition from 1-ethyl-3-methylimidazolium Chloride and Acetamide Electrolytes

Role of BiCl3 Additives for Aluminum Electrodeposition in Aluminum Trifluoromethanesulfonate-Based Electrolytes: A Critical Evaluation

Growth of rock-salt MgO–NiO–ZnO films: Relationship between lattice constant and composition

Optimal Oxidation Conditions Using Water Vapor for the Topotactic Formation of High-Quality Vanadium Dioxide Films from Vanadium Sesquioxide Epitaxial Films

Fabrication of epitaxial V<sub>2</sub>O<sub>3</sub> thin films on Al<sub>2</sub>O<sub>3</sub> substrates via mist chemical vapor deposition

Fabrication of epitaxial V2O3 thin films on Al2O3 substrates via mist chemical vapor deposition

Chasing Schottky–Mott: Metal-first non-alloyed contacts to β-Ga2O3 for interface quality and minimal surface modification

Fabrication of micron-sized three-dimensional porous Al from an Al-Zn monotectoid alloy via selective etching and Al passivation

Toward Tungsten Electrodeposition at Moderate Temperatures Below 100 °C Using Chloroaluminate Ionic Liquids

Aluminum Barrel Plating on Steel Bolts Using Chloroaluminate Ionic Liquids

Scalable Fabrication of Metal Halide Perovskites for Direct X-ray Flat-Panel Detectors: A Perspective

Aluminum Electrodeposition in Dry Air Atmosphere: Comparative Study of an Acetamide–AlCl3 Deep Eutectic Solvent and a 1-Ethyl-3-Methylimidazolium Chloride–AlCl3 Ionic Liquid

Formation of Uniquely Oriented VO2 Thin Films by Topotactic Oxidation of V2O3 Epitaxial Films on R-Plane Al2O3

Tungsten(II) chloride hydrates with high solubility in chloroaluminate ionic liquids for the electrodeposition of Al–W alloy films

Aluminum Barrel Plating on Steel Bolts Using Chloroaluminate Ionic Liquids

Scalable Fabrication of Metal Halide Perovskites for Direct X-ray Flat-Panel Detectors: A Perspective

Mist CVD of vanadium dioxide thin films with excellent thermochromic properties using a water-based precursor solution

Columnar Grain Growth of Lead-Free Double Perovskite Using Mist Deposition Method for Sensitive X-ray Detectors

One-Step Coating of Full-Coverage CsPbBr3 Thin Films via Mist Deposition for All-Inorganic Perovskite Solar Cells

Mist chemical vapor deposition of MoO2 thin films

Epitaxial Growth and Bandgap Control of Ni1-xMgxO Thin Film Grown by Mist Chemical Vapor Deposition Method

Collaborators (5)

Toshiya Doi

Tetsuji Hirato

Masao Miyake

Cameron Gorsak

Masakazu Tane

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