Um Doo-Seung

Assistant Professor

Sejong University

South Korea

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Um Doo-Seung is an Assistant Professor at Sejong University in South Korea. His research areas include plasma-modulated thin films, UV sensing technologies, and the effects of plasma treatments on materials, as demonstrated in his recent publications. His work encompasses novel applications of MXene composites and investigations into the magnetic properties of various thin films.

Articles (17)

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2025

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2021

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2021

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2021

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2021

Collaborators (3)

Jung-Woo Yoo

Institute of Science and Technology

SOUTH KOREA

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Jong-Chang Woo

Professor

SOUTH KOREA

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Bo Hou

Senior Lecturer

Cardiff University

UNITED KINGDOM

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Um Doo-Seung

Research Interests

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Articles (17)

Plasma-driven defect modulation in ZnO thin films for superior UV sensing

Impact of interface paramagnetism and local defects on low-temperature magnetic properties of YIG thin films on GGG

Oxygen-plasma-induced Cu2O MSM photodetector derived from metallic Cu thin film for UV sensing

Impact of CF4 plasma etching on defect formation and material properties of Al2O3 thin films

Biodegradable and healable strain gauge based on Ti3C2TX MXene-gelatin hydrogel composite for eco-friendly applications

Transition of Cu film to Cu2O film through oxygen plasma treatment

Nanohole texturing to improve the performance of a microscopic photodetector

Reducing the oxygen vacancy concentration in SrTiO3-δ thin films via an optimized O2 plasma treatment for enhancing device properties

Plasma etching and surface characteristics depending on the crystallinity of the BaTiO3 thin film

The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF6/O2 Plasma Etching Conditions

Etching characteristics and surface properties of fluorine-doped tin oxide thin films under CF4-based plasma treatment

Electrical Properties and Thermal Annealing Effects of Polycrystalline MoS2-MoSX Nanowalls Grown by Sputtering Deposition Method

Tunable physical properties of Al-doped ZnO thin films by O2 and Ar plasma treatments

BCl3/Ar plasma etching for the performance enhancement of Al-doped ZnO thin films

Pure Spin Currents Driven by Colossal Spin–Orbit Coupling on Two-Dimensional Surface Conducting SrTiO3

Etching Characteristics and Changes in Surface Properties of IGZO Thin Films by O2 Addition in CF4/Ar Plasma

Current Rectification, Resistive Switching, and Stable NDR Effect in BaTiO 3 /CeO 2 Heterostructure Devices

Collaborators (3)

Jung-Woo Yoo

Jong-Chang Woo

Bo Hou

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