Yasin Ekinci

Paul Scherrer Institut

Switzerland

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Articles (20)

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2025

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2022

Collaborators (7)

Suresh Valiyaveettil

Associate Professor

National University of Singapore (NUS)

SINGAPORE

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Neil Curson

University College London

UNITED KINGDOM

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Alex Robinson

University of Birmingham

UNITED KINGDOM

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Steven Schofield

University College London

UNITED KINGDOM

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Celestino Padeste

Paul Scherrer Institut

SWITZERLAND

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Per Magnus Kristiansen

University College Dublin

IRELAND

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Daniela STORNAIUOLO

Università degli Studi di Roma La Sapienza Dipartimento di Fisica

ITALY

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Yasin Ekinci

Research Interests

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Articles (20)

Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types

Nonchemically-Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half-Pitch Nanolithography

Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography

Prior–primed deep neural network based EUV mask inspection

EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Extreme ultraviolet lithography

A novel water developable tetraphenyltin-based nonchemically-amplified molecular resist for sub-13 nm lithography

Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions

Extreme ultraviolet lithography reaches 5 nm resolution

High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers

Charge Configuration Memory Devices: Energy Efficiency and Switching Speed

Influence of Counteranions on the Performance of Tin-based EUV Photoresists

Injection Molding of Thermoplastics for Low-Cost Nanofluidic Devices

Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology

Poly(methyl methacrylate)-Based Nanofluidic Device for Rapid and Multiplexed Serological Antibody Detection of SARS-CoV-2

Sensitivity enhancement of a high-resolution negative-Tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography

Special Section Guest Editorial: Non-chemically Amplified Resists for EUV Lithography

Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography

Collaborators (7)

Suresh Valiyaveettil

Neil Curson

Alex Robinson

Steven Schofield

Celestino Padeste

Per Magnus Kristiansen

Daniela STORNAIUOLO

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