Daniel Lundin

Senior Associate Professor

Linköping University

Sweden

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Articles (14)

Year:

2024

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2024

Year:

2024

Year:

2023

Year:

2023

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2023

Year:

2023

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2023

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2023

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2023

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2023

Year:

2023

Year:

2023

Year:

2022

Collaborators (11)

Jon Tomas Gudmundsson

KTH Royal Institute of Technology

SWEDEN

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Sanath Kumar Honnali

Uppsala University

SWEDEN

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Ching-Lien Hsiao

Associate Professor (Senior Lecturer)

Linköping University

SWEDEN

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T. Minea

Université Paris-Saclay

FRANCE

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Per Persson

Professor

Linköping University

SWEDEN

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Martin Rudolph

Leibniz Institute of Surface Engineering

GERMANY

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Grzegorz Greczynski

Professor

Linköpings universitet Tekniska högskolan

SWEDEN

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Jaroslav Hnilica

Assistant professor

Masaryk University

CZECH REPUBLIC

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Arnaud le Febvrier

Senior staff scientist , Docent (equivalent associate professor)

Linköping University

SWEDEN

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J. W. Bradley

UNITED KINGDOM

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Michal Zanáška

Linköping University

SWEDEN

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Daniel Lundin

Research Interests

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Articles (14)

High power impulse magnetron sputtering of a zirconium target

On working gas rarefaction in high power impulse magnetron sputtering

Plasma electron characterization in electron chemical vapor deposition

Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings

HiPIMS-grown AlN buffer for threading dislocation reduction in DC-magnetron sputtered GaN epifilm on sapphire substrate

Corundum-structured AlCrNbTi oxide film grown using high-energy early-arriving ion irradiation in high-power impulse magnetron sputtering

Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges

Temporal, spatial and spectroscopic study of plasma emission on Cu target in bipolar HiPIMS

Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges

High power impulse magnetron sputtering of tungsten: a comparison of experimental and modelling results

Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons

Target ion and neutral spread in high power impulse magnetron sputtering

Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction

Ionization region model of high power impulse magnetron sputtering of copper

Collaborators (11)

Jon Tomas Gudmundsson

Sanath Kumar Honnali

Ching-Lien Hsiao

T. Minea

Per Persson

Martin Rudolph

Grzegorz Greczynski

Jaroslav Hnilica

Arnaud le Febvrier

J. W. Bradley

Michal Zanáška

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