Martin Rudolph

Leibniz Institute of Surface Engineering

Germany

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Articles (17)

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2025

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2025

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2024

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2024

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2023

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2022

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2022

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2022

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2022

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2022

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2022

Collaborators (9)

Jon Tomas Gudmundsson

KTH Royal Institute of Technology

SWEDEN

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T. Minea

Université Paris-Saclay

FRANCE

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Adrien Revel

Université Paris-Saclay

FRANCE

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Andre Anders

Professor

Leipzig University

GERMANY

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J. W. Bradley

UNITED KINGDOM

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Thomas Arnold

Professor of ultra-precision machining of surfaces with ions and plasmas

Technische Universität Dresden

GERMANY

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Jürgen W. Gerlach

Leibniz Institute of Surface Engineering

GERMANY

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Daniel Lundin

Senior Associate Professor

Linköping University

SWEDEN

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Tetsuhide Shimizu

Associate Professor

University of Tokyo

JAPAN

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Martin Rudolph

Research Interests

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Articles (17)

Postannealing-induced intermetallic phase formation in NiPt thin films deposited via direct current and high-power impulse magnetron sputtering

Self-regulating electron temperature in high-power impulse magnetron sputtering discharges and its effect on the metal ion escape

High power impulse magnetron sputtering of a zirconium target

On working gas rarefaction in high power impulse magnetron sputtering

Generating spokes in direct current magnetron sputtering discharges by an azimuthal strong-to-weak magnetic field strength transition

Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges

Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges

High power impulse magnetron sputtering of tungsten: a comparison of experimental and modelling results

Target ion and neutral spread in high power impulse magnetron sputtering

Low‐temperature atmospheric pressure plasma conversion of polydimethylsiloxane and polysilazane precursor layers to oxide thin films

Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction

Ionization region model of high power impulse magnetron sputtering of copper

Dynamics and 2D temperature distribution of plasma obtained by femtosecond laser-induced breakdown

On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge

Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

Modeling of high power impulse magnetron sputtering discharges with tungsten target

Operating modes and target erosion in high power impulse magnetron sputtering

Collaborators (9)

Jon Tomas Gudmundsson

T. Minea

Adrien Revel

Andre Anders

J. W. Bradley

Thomas Arnold

Jürgen W. Gerlach

Daniel Lundin

Tetsuhide Shimizu

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