Il-Kwon Oh

Ajou University

South Korea

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Articles (23)

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Collaborators (7)

Hong Sub Lee

Assistant Professor

Kyung Hee University - Global Campus

SOUTH KOREA

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Se-Hun Kwon

Pusan National University

SOUTH KOREA

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Sangwoo Shin

Assistant Professor

University at Buffalo

UNITED STATES

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Bo Keun Park

Korea Research Institute of Chemical Technology

SOUTH KOREA

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Ralf Tonner-Zech

Professor for Theoretical Chemistry of complex systems

Leipzig University

GERMANY

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Eric Pop

Professor

Stanford University

UNITED STATES

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Han-Bo-Ram Lee

Professor

Incheon National University

SOUTH KOREA

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Il-Kwon Oh

Research Interests

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Articles (23)

Role of atomic arrangements in IGZO thin films for ultrathin thin-film-transistor devices

Area‐Selective Atomic Layer Deposition on Homogeneous Substrate for Next‐Generation Electronic Devices

Exploring surface chemistry and electrical performance of zinc tin oxide thin films with controlling elemental composition grown by atomic layer deposition

Rapid cooling process-driven enhancement of an orthorhombic phase in ferroelectric HfZrOx of sub-3 nm ultrathin films by atomic layer deposition

Role of a cyclopentadienyl ligand in Hf precursors using H2O or O3 as oxidant in atomic layer deposition

Low-Temperature (450 ∘C) Crystallization of Al:HfO2 Ferroelectric Thin Films Enabled by Microwave Annealing Process

Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices

Correction to “Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films”

Si precursor inhibitors for area selective deposition of Ru

Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

Kinetically Stabilized Hafnia Ferroelectric of Al-Doped HfO₂ Film by Fast Ramping and Fast Cooling Process

Effect of passivation layers in bilayer with ZrO2 on Ge substrate for improved thermal stability

Area-Selective Atomic Layer Deposition for Resistive Random-Access Memory Devices

Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films

Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor

Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides

Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3–x and Al(CyH2y+1)3 Precursors

Tuning Molecular Inhibitors and Aluminum Precursors for the Area-Selective Atomic Layer Deposition of Al2O3

Unveiling the Effect of Superlattice Interfaces and Intermixing on Phase Change Memory Performance

Self-Formation of Superhydrophobic Surfaces through Interfacial Energy Engineering between Liquids and Particles

Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al2O3 with a Series of Alcohol Oxidants

Role of Precursor Choice on Area-Selective Atomic Layer Deposition

Area-Selective Molecular Layer Deposition of a Silicon Oxycarbide Low-k Dielectric

Collaborators (7)

Hong Sub Lee

Se-Hun Kwon

Sangwoo Shin

Bo Keun Park

Ralf Tonner-Zech

Eric Pop

Han-Bo-Ram Lee

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