Han-Bo-Ram Lee

Professor

Incheon National University

South Korea

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Han-Bo-Ram Lee is a Professor at Incheon National University in South Korea. His research focuses on advanced materials chemistry, particularly in the areas of atomic layer deposition and surface engineering. Recent publications include studies on superhydrophobic coatings, area-selective deposition techniques, and ferroelectric thin films. He is dedicated to exploring the synergistic effects of novel materials and processes to enhance the performance of functional coatings.

Articles (19)

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2025

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2021

Collaborators (6)

Aravind H. PATIL

Korea Polar Research Institute

SOUTH KOREA

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Il-Kwon Oh

Ajou University

SOUTH KOREA

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Hong Sub Lee

Assistant Professor

Kyung Hee University - Global Campus

SOUTH KOREA

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Soo‐Hyun Kim

SOUTH KOREA

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Ralf Tonner-Zech

Professor for Theoretical Chemistry of complex systems

Leipzig University

GERMANY

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Min Hyuk Park

Assistant Professor

Seoul National University

SOUTH KOREA

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Han-Bo-Ram Lee

Research Interests

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About

Articles (19)

Synergistic effects of ionic liquid integrated superhydrophobic composite coatings on anti-icing properties

Functionalization of Si3N4 with an aldehyde inhibitor for area selective deposition of HfO2 and SiO2

Patterning Technology: From Supporting Role to Main Player in Materials Chemistry

Atomic-Level Stoichiometry Control of Ferroelectric HfxZryOz Thin Films by Understanding Molecular-Level Chemical Physical Reactions

Correction to “Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films”

Si precursor inhibitors for area selective deposition of Ru

Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation

Facile Approach for Designing Icephobic Coatings Using Polymers/Silica Nanoparticle Composites via Self‐Formation of Superhydrophobic Surfaces

Organosulfide Inhibitor Instigated Passivation of Multiple Substrates for Area-Selective Atomic Layer Deposition of HfO2

Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films

Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor

Borderless Collaboration in Materials Chemistry for an Industrial Ecosystem in the Semiconductor Industry

Atomic Layer Deposition Beyond Thin Film Deposition Technology

Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer

Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3–x and Al(CyH2y+1)3 Precursors

Icephobic Coating through a Self-Formed Superhydrophobic Surface Using a Polymer and Microsized Particles

Evaluation of silicon tetrahalide precursors for low-temperature thermal atomic layer deposition of silicon nitride

Toward Enhanced Humidity Stability of Triboelectric Mechanical Sensors via Atomic Layer Deposition

Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches

Collaborators (6)

Aravind H. PATIL

Il-Kwon Oh

Hong Sub Lee

Soo‐Hyun Kim

Ralf Tonner-Zech

Min Hyuk Park

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