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Nikhil Tiwale

Scientific Research Staff

Brookhaven National Laboratory

United States

Research Interests

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Articles (20)

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2025

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Collaborators (8)

Lior Shani

Researchers, Research Professional 6

University of Minnesota

UNITED STATES

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Ajith Pattammattel

Research Scientist

Brookhaven National Laboratory

UNITED STATES

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Suresh Valiyaveettil

Associate Professor

National University of Singapore (NUS)

SINGAPORE

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Mingzhao Liu

Staff Scientist

Brookhaven National Laboratory

UNITED STATES

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Kevin Yager

Materials Scientist

Brookhaven National Laboratory

UNITED STATES

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Yasin Ekinci

Paul Scherrer Institut

SWITZERLAND

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Xu Du

Associate Professor

Stony Brook University

UNITED STATES

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Oleg Gang

Professor

Columbia University

UNITED STATES

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Nikhil Tiwale

Research Interests

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Articles (20)

Scalable Fabrication of Chip-Integrated 3D Nanostructured Electronic Devices via DNA-Programmable Assembly

Accelerating Discovery of Solid‐State Thin‐Film Metal Dealloying for 3D Nanoarchitecture Materials Design through Laser Thermal Gradient Treatment

Accelerating Discovery of Solid‐State Thin‐Film Metal Dealloying for 3D Nanoarchitecture Materials Design through Laser Thermal Gradient Treatment (Small 35/2025)

Inspection of next-generation EUV resists with nano-projectile secondary ion mass spectrometry

Impact of Zn-based inorganic-organic hybrid thin film structure on patterning performance for dry EUV resist applications

In-situ investigation of as-cast homopolymer-based resists

Inspection of next generation hybrid EUV resists with NP-SIMS

A comprehensive analysis of low-energy electron exposure on ALD-synthesized inorganic-organic hybrid resist thin films for dry EUV resist platform

High-sensitivity positive-tone hybrid EUV resist synthesized by vapor phase metal-oxide infiltration

Modeling photoacid diffusion in chemically amplified resists via proximity effect correction in electron beam lithography

Vapor-phase metal infiltration for inorganic-organic hybrid extreme ultraviolet lithography resists

Macroscale-area patterning of three-dimensional DNA-programmable frameworks

Electron-induced chemical transformation of vapor-phase synthesized hybrid resist materials for EUV and beyond EUV lithography

<i>In Situ</i> Analysis of Electron-Induced Chemical Transformations in Vapor-Phase-Synthesized Al-Based Inorganic–Organic Hybrid Thin Films for EUV Resist Platform

Mitigating challenges in aberration-corrected electron-beam lithography on electron-opaque substrates

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Inspection of next generation EUV resists with nano-projectile SIMS

Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications

Three-dimensional nanoscale metal, metal oxide, and semiconductor frameworks through DNA-programmable assembly and templating

Effects of alumina priming on the electrical properties of ZnO nanostructures derived from vapor-phase infiltration into self-assembled block copolymer thin films

Collaborators (8)

Lior Shani

Ajith Pattammattel

Suresh Valiyaveettil

Mingzhao Liu

Kevin Yager

Yasin Ekinci

Xu Du

Oleg Gang

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