Steven Shannon

Professor

North Carolina State University

United States

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Professor Steven Shannon is a faculty member at North Carolina State University in the United States. His research areas include plasma applications in microelectronics, inductively coupled plasma systems, and the design and modeling of advanced nuclear reactor technologies. Recent articles authored by Professor Shannon explore topics such as plasma surface ionization waves, radio-frequency ion sources, and the dynamics of plasma sheath interactions.

Articles (14)

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2025

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2025

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2024

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2024

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2023

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2023

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2023

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2022

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2021

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2021

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2021

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2020

Collaborators (5)

Katharina Stapelmann

UNITED STATES

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Davide Curreli

Associate Professor

Grainger College of Engineering, University of Illinois at Urbana-Champaign

UNITED STATES

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Amanda Lietz

Asssistant Professor

North Carolina State University

UNITED STATES

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Jane Chang

Professor

University of California, Los Angeles

UNITED STATES

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David Barry Graves

Professor

Princeton University

UNITED STATES

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Steven Shannon

Research Interests

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About

Articles (14)

Design and Study of Inductively Coupled Plasma Chamber Components Using the SupRISE Test Device at DIII-D

Design and Engineering of LUPIN: A Test-Bed Radio-Frequency Ion Source for Enhanced Neutral Beam Injection on DIII-D

Estimation of mean electron energy in helium surface ionization waves on dielectric substrates

Science challenges and research opportunities for plasma applications in microelectronics

Verification methods for drift–diffusion reaction models for plasma simulations

Design, Modeling, and Analysis of a Compact-External Electromagnetic Pumping System for Pool-Type Liquid Metal-Cooled Fast Reactors

Plasma surface ionization wave interactions with single channels

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Effect of dielectric target properties on plasma surface ionization wave propagation

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms

Focus ring geometry influence on wafer edge voltage distribution for plasma processes

Electron temperature measurements with a hairpin resonator probe in a pulsed low pressure capacitively coupled plasma

Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]

Collaborators (5)

Katharina Stapelmann

Davide Curreli

Amanda Lietz

Jane Chang

David Barry Graves

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