Tae Joo Park

Professor

Hanyang University - Ansan Campus

South Korea

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About

Professor Tae Joo Park is a faculty member at Hanyang University - Ansan Campus in South Korea (+82). His research focuses on various areas including atomic layer deposition, selective atomic layer etching, and the development of advanced nanocomposites for photocatalytic performance. Recent publications highlight his work on high-temperature deposition techniques and enhancements in the electrical properties of thin films.

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2022

Collaborators (3)

Seong Keun Kim

Korea Advanced Institute of Science and Technology

SOUTH KOREA

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Woo‐Hee Kim

SOUTH KOREA

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Ji-hoon Ahn

Assistant Professor

Korea Maritime and Ocean University

SOUTH KOREA

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Tae Joo Park

Research Interests

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About

Articles (22)

Enhancing the crystallinity and dielectric performance of ALD-grown SrTiO3 films by introducing a sub-nm-thick Pt layer

Atomic Layer Deposition of ZrO2 Films at High Temperatures (>350 °C) Using a Modified Cyclopentadienyl Zr Precursor

Oxidation-State-Dependent Selective Atomic Layer Etching of Metal Oxides

Atomically doped carbon on highly porous nickel sulfide for efficient hydrogen evolution reaction

Ternary Logic Transistors Using Multi‐Stacked 2D Electron Gas Channels in Ultrathin Oxide Heterostructures

High-temperature atomic layer deposition of HfO2 film with low impurity using a novel Hf precursor

Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction

Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminum

Systematically designed g-C3N4/rGO/MoS2 nanocomposite for enhanced photocatalytic performance

Effect of ultra-thin ZnS passivation using ALD technique on the performance of heterojunction solar cells

Contrasting photocatalytic performance of quantum-dot sensitized p-type and n-type TiO2 hierarchical nanocomposites under visible light

Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition

Grain boundary engineering strategy for simultaneously reducing the electron concentration and lattice thermal conductivity in n-type Bi2Te2.7Se0.3-based thermoelectric materials

Advanced atomic layer deposition (ALD): controlling the reaction kinetics and nucleation of metal thin films using electric-potential-assisted ALD

Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method

Antiviral role of nanomaterials: a material scientist's perspective

High-quality SiNx thin-film growth at 300 °C using atomic layer deposition with hollow-cathode plasma

Interfaces in Atomic Layer Deposited Films: Opportunities and Challenges

Interfaces in Atomic Layer Deposited Films: Opportunities and Challenges

Effects of Zr content and annealing on ferroelectricity of as-grown crystalline Hf1-xZrxO2 thin films using Hf[Cp(NMe2)3] and Zr[Cp(NMe2)3] precursors via atomic layer deposition

Advances in Atomic Layer Deposition of Metal Sulfides: From a Precursors Perspective

Advanced Atomic Layer Deposition: Ultrathin and Continuous Metal Thin Film Growth and Work Function Control Using the Discrete Feeding Method

Collaborators (3)

Seong Keun Kim

Woo‐Hee Kim

Ji-hoon Ahn

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