Taesung Kim

Professor

Sungkyunkwan University - Natural Sciences Campus

South Korea

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Professor Taesung Kim is a faculty member at Sungkyunkwan University - Natural Sciences Campus in South Korea. His research areas include nanotechnology, machine learning applications in catalysis, and advanced materials for 3D printing. Recent publications highlight his work on nanoparticle size distribution measurements, large-scale synthesis of transition metal dichalcogenides, and the optimization of chemical mechanical polishing techniques.

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Collaborators (4)

Changshin Jo

Pohang University of Science and Technology

SOUTH KOREA

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Jin Kon Kim

Professor

Pohang University of Science and Technology

SOUTH KOREA

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Soochan Kim

University of Cambridge

UNITED KINGDOM

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Hyeong-U Kim

Assistant Professor

University of Science and Technology (UST)

SOUTH KOREA

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Taesung Kim

Research Interests

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About

Articles (25)

Strain‐Assisted Large‐Scale 1T‐MoS<sub>2</sub> Synthesis and its Optical Synaptic Flash Memory Application

Reversible Thixotropic Rheological Properties of Graphene-Incorporated Epoxy Inks for Self-Standing 3D Printing

Nanoparticle size distribution measurement scheme using mass-to-charge ratio measurements with Vacuum Ultraviolet irradiation in medium vacuum

Exploring the Influence of Applied Potential and Catalyst Morphology on the Selectivities of Copper Toward Carbon Dioxide Electroreduction Using Machine Learning

Stable and efficient chlorine evolution reaction with atomically dispersed Ru on surface tensile strained TiO2

Optimization of surface filtration to enhance wafer uniformity by removing large particle in ceria slurry

An eddy current sensor for end-point detection in chemical mechanical planarization using composition signal filtration and a digital potentiometer

Investigation of the removal mechanism in amorphous carbon chemical mechanical polishing for achieving an atomic-scale roughness

Machine learning-driven catalyst design, synthesis and performance prediction for CO2 hydrogenation

Beyond von Neumann Architecture: Brain‐Inspired Artificial Neuromorphic Devices and Integrated Computing

Particle size dependence of nanoclustered ceria abrasives on surface activity and chemical mechanical planarization performance

In Situ Bipolar Doping via Mechanically Controlled Dipole Under Water

Investigation of thermal effects in bulk oxide chemical mechanical polishing

Effects of Gas-Dissolved Water for Ceria Nanoparticles on the SiO2 Film Surface in Post-CMP Cleaning

Investigating the Impact of Pad Groove Depth Reduction on Process Variation in Oxide Chemical Mechanical Polishing

Block Copolymer-Directed Facile Synthesis of N-Doped Mesoporous Graphitic Carbon for Reliable, High-Performance Zn Ion Hybrid Supercapacitor

Size distribution measurement of mixed abrasive slurry for chemical mechanical planarization using an electrospray scanning mobility particle sizer

Evaluation of chemical mechanical planarization slurry dispersion using a combined scanning mobility particle sizer-optical particle sizer system

Electrostatic-Induced Particle Behavior Simulation Framework in Cleaning Process: Interaction between Solid-Liquid Interfaces

Investigation of Effects of Sulfuric Acid in Single Wafer Cleaning Process Using Isopropyl Alcohol

Environmentally friendly buff cleaning of ceria nanoparticles using bubbles in gas-dissolved water

Selective Nanoscale Fabrication with Roughness Reduction of Polycrystalline Silicon by Physically Induced Fluorine Bonds Using Atomic Force Microscope

Selective Nanoscale Fabrication with Roughness Reduction of Polycrystalline Silicon by Physically Induced Fluorine Bonds Using Atomic Force Microscope

Improvement of oxide chemical mechanical polishing performance by increasing Ce3+/Ce4+ ratio in ceria slurry via hydrogen reduction

A study of highly activated hydrogen evolution reaction performance in acidic media by 2D heterostructure of N and S doped graphene on MoOx

Collaborators (4)

Changshin Jo

Jin Kon Kim

Soochan Kim

Hyeong-U Kim

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