Takae Takeuchi

Has grant

Associate Professor

Nara Women's University

Japan

Research Interests

Explore related searches

Professors in Japan

Contact this professor

Get a free first email built on one of their papers, ready for you to edit and send yourself.

About

Takae Takeuchi is an Associate Professor at Nara Women's University in Japan. His research encompasses areas such as ion beam-induced chemical vapor deposition, the behavior of volatile organic compounds, and molecular ion formation. Recent articles highlight his work on the growth dynamics during deposition processes and the stability of chemical compounds in various reactions.

Recent Grants

Grant: Close

Establishment of the next-generation cultural assets mold pollution control law based on the smell material on-site many points measurement

Open Date: 2018-04-01

Close Date: 2021-03-01

Articles (8)

Year:

2025

Year:

2024

Year:

2024

Year:

2022

Year:

2022

Year:

2021

Year:

2020

Year:

2020

Collaborators (1)

Masato Kiuchi

Specially Appointed Professor

Osaka University

JAPAN

View details

ApplyKite TwinLearns as you apply

Make your next move.

Prepare your application

Review drafts before you send them.

Takae Takeuchi

Research Interests

Explore related searches

Contact this professor

About

Recent Grants

Articles (8)

Identification of fragments from triethylamine and generation of molecular ions containing carbon and nitrogen

Low-energy N+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate, hexamethyldisiloxane, or hexamethyldigermane

Self-inhibition of growth and allelopathy through volatile organic compounds in Fusarium solani and Aspergillus fumigatus

Injection of low-energy SiCH5+ ion-beam to Si substrate during chemical vapor deposition process using methylsilane

Low-energy oxygen ion beam induced chemical vapor deposition using methylsilane or dimethylsilane for the formation of silicon dioxide films

Low-energy O+ ion beam induced chemical vapor deposition using hexamethyldisilane or hexamethyldisilazane for silicon dioxide film formation

Production of low-energy fragment-ion beams from hexamethyldisiloxane and the irradiation of SiO+ ion beam to substrates with supplemental oxygen gas for SiO2 film formation

Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes

Collaborators (1)

Masato Kiuchi

Make your next move.