Won-Jun Lee

Professor

Sejong University

South Korea

Research Interests

Explore related searches

Professors in South Korea

Contact this professor

Get a free first email built on one of their papers, ready for you to edit and send yourself.

About

Won-Jun Lee is a Professor at Sejong University, South Korea. His research primarily focuses on atomic layer deposition and etching processes, with recent articles exploring mechanisms and techniques for materials such as aluminum oxide, aluminum nitride, and zirconium oxide. His work contributes to advancements in semiconductors and light-emitting diodes, enhancing the understanding of thin film growth and gas-phase reactions.

Articles (19)

Year:

2025

Year:

2025

Year:

2025

Year:

2025

Year:

2025

Year:

2024

Year:

2024

Year:

2024

Year:

2024

Year:

2023

Year:

2023

Year:

2023

Year:

2022

Year:

2022

Year:

2022

Year:

2022

Year:

2022

Year:

2022

Year:

2022

Collaborators (4)

Jongwan Jung

Sejong University

SOUTH KOREA

View details

Soo‐Hyun Kim

SOUTH KOREA

View details

Seongjae Cho

Associate Professor

Ewha Womans University

SOUTH KOREA

View details

Romel Hidayat

Assistant Professor

Sejong University

SOUTH KOREA

View details

ApplyKite TwinLearns as you apply

Make your next move.

Prepare your application

Review drafts before you send them.

Won-Jun Lee

Research Interests

Explore related searches

Contact this professor

About

Articles (19)

Thermal atomic layer etching mechanism of amorphous aluminum oxide by hydrogen fluoride and trimethylaluminum: First-principles study

Low-Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Thin Films for Passivation Layers in GaN-Based Light-Emitting Diodes

Rapid extraction of the dielectric constant of atomically thin ZrO2 prepared through atomic layer deposition and atomic layer etching

Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies

Reaction mechanism of atomic layer deposition of zirconium oxide using tris(dimethylamino)cyclopentadienyl zirconium: experimental and theoretical study

High-temperature atomic layer deposition of silicon oxide films using Tris(dimethylamino)silane and ozone

Growth mechanism of Ge2Sb2Te5 thin films by atomic layer deposition supercycles of GeTe and SbTe

Chemisorption of tetrakis(dimethylamino)zirconium on zirconium oxide: Density functional theory study

Chemisorption of silicon tetrachloride on silicon nitride: a density functional theory study

Gas-phase etching mechanism of silicon oxide by a mixture of hydrogen fluoride and ammonium fluoride: A density functional theory study

A theoretical study on the surface reaction of tetrakis(dimethylamino)titanium on titanium oxide

Selective etching mechanism of silicon oxide against silicon by hydrogen fluoride: a density functional theory study

Electrical Reliability of Flexible Silicon Package Integrated On Polymer Substrate During Repeated Bending Deformations

Erratum: “Density functional theory study on the fluorination reactions of silicon and silicon dioxide surfaces using different fluorine-containing molecules” [J. Vac. Sci. Technol. A 37, 021001 (2019)]

Density functional theory study on the selective capping of cobalt on copper interconnect

Finite Element Analysis for Safe Design of a Flexible Microelectronic System under Bending Deformation

Preparation of tungsten-based thin films using a F-free W precursor and tert-butyl hydrazine via 2- and 3-step atomic layer deposition process

Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)silane and ozone

Atomic layer deposition of silicon oxide films using bis(dimethylaminomethylsilyl)trimethylsilylamine and ozone: first-principles and experimental study

Collaborators (4)

Jongwan Jung

Soo‐Hyun Kim

Seongjae Cho

Romel Hidayat

Make your next move.