Andre Anders

Professor

Leipzig University

Germany

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Professor Andre Anders is a faculty member at Leipzig University in Germany. His research focuses on thin films, plasma processes, and material synthesis, exemplified by his recent articles on cathode spot motion, intermetallic phase formation in thin films, and discharge modes in plasma systems. He is actively contributing to the understanding of ion flux effects on crystallinity and structuring in various material systems.

Articles (17)

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2025

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2025

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2025

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2024

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2024

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2024

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2023

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2022

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2022

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2022

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2022

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2022

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2021

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2021

Collaborators (6)

Jon Tomas Gudmundsson

KTH Royal Institute of Technology

SWEDEN

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Adrien Revel

Université Paris-Saclay

FRANCE

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Martin Rudolph

Leibniz Institute of Surface Engineering

GERMANY

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Thomas Arnold

Professor of ultra-precision machining of surfaces with ions and plasmas

Technische Universität Dresden

GERMANY

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Jürgen W. Gerlach

Leibniz Institute of Surface Engineering

GERMANY

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David McKenzie

Professor

University of Sydney

AUSTRALIA

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Andre Anders

Research Interests

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Articles (17)

Generalized random walk model of cathode spot motion

Postannealing-induced intermetallic phase formation in NiPt thin films deposited via direct current and high-power impulse magnetron sputtering

Decoupling the effects of potential energy, kinetic energy, and ion flux on crystallinity of V-Al and V-Al-N thin films in pulsed filtered cathodic arc deposition

Glows, arcs, ohmic discharges: An electrode-centered review on discharge modes and the transitions between them

Heteroepitaxial growth of Ga2O3 thin films on Al2O3(0001) by ion beam sputter deposition

Generating spokes in direct current magnetron sputtering discharges by an azimuthal strong-to-weak magnetic field strength transition

Time- and Position-Dependent Breakdown Volume Calculations to Explain Experimentally Observed Femtosecond Laser-Induced Plasma Properties

Low‐temperature atmospheric pressure plasma conversion of polydimethylsiloxane and polysilazane precursor layers to oxide thin films

Energetic Electron-Assisted Synthesis of Tailored Magnetite (Fe3O4) and Maghemite (γ−Fe2O3) Nanoparticles: Structure and Magnetic Properties

Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arc

Foundations of physical vapor deposition with plasma assistance

Dynamics and 2D temperature distribution of plasma obtained by femtosecond laser-induced breakdown

Building on excellence and reputation, a more inclusive Journal of Applied Physics evolves

On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge

Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

Electron transport in high power impulse magnetron sputtering at low and high working gas pressure

High-resolution observation of cathodic arc spots in a magnetically steered arc plasma source in low pressure argon, nitrogen, and oxygen atmospheres

Collaborators (6)

Jon Tomas Gudmundsson

Adrien Revel

Martin Rudolph

Thomas Arnold

Jürgen W. Gerlach

David McKenzie

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