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Chi Thang Nguyen

Group Leader

Leibniz Institute for Solid State and Materials Research

Germany

Research Interests

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Professors in Germany

Articles (14)

Year:

2026

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2026

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2026

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2026

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2025

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2025

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2025

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2025

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2025

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2025

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2025

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2024

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2023

Collaborators (6)

Aravind H. PATIL

Korea Polar Research Institute

SOUTH KOREA

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Rajeev Surendran Assary

Group Leader/Scientist

Argonne National Laboratory

UNITED STATES

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Tamar Segal-Peretz

Associate Professor

Technion - Israel Institute of Technology

ISRAEL

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TENDERO Claire

Associate professor

Toulouse INP

FRANCE

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Min Hyuk Park

Assistant Professor

Seoul National University

SOUTH KOREA

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Han-Bo-Ram Lee

Professor

UNIST

SOUTH KOREA

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Chi Thang Nguyen

Research Interests

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Articles (14)

Single‐Step Recovery of Water from Stable Crude Oil‐Water Emulsion Using Surface Engineered Hybrid Inorganic‐Polymer Membranes

Design and performance of AI agents interfacing with an atomic layer deposition tool

Area selective deposition of tungsten and ruthenium using a tungsten precursor inhibitor

Precision nanoengineering of photoelectrochemical devices via atomic layer deposition

Functionalization of Si3N4 with an aldehyde inhibitor for area selective deposition of HfO2 and SiO2

Atomic-Level Stoichiometry Control of Ferroelectric HfxZryOz Thin Films by Understanding Molecular-Level Chemical Physical Reactions

Ru:Al2O3 Resistive Coatings Fabricated by Atomic Layer Deposition for Application in Microchannel Plates

Atomic Layer Modulation of Ruthenium Aluminum Oxide through Reactivity Control of Precursors for Seedless Copper Interconnects

Chemical Vapor Transformation of Lithium Metal: Mechanism and Enhanced Stability

Area Selective Deposition of Metal on Dielectric Using Aldehyde Inhibitor and Novel Ruthenium Precursor

Thermal Atomic Layer Deposition of Ba Thin Films: Exploring Their Emissive Behavior for Advanced Neutron Imaging

Benchmarking large language models for materials synthesis: The case of atomic layer deposition

Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation

Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor

Collaborators (6)

Aravind H. PATIL

Rajeev Surendran Assary

Tamar Segal-Peretz

TENDERO Claire

Min Hyuk Park

Han-Bo-Ram Lee

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