Dai Okamoto
Associate Professor
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About
Dai Okamoto is an Associate Professor at Toyama Prefectural University in Japan. His research primarily focuses on the energy levels of carbon dangling-bond centers in silicon carbide interfaces, dipole scattering in silicon carbide MOSFETs, and the conduction mechanisms of oxide leakage currents. Recent publications include studies on threshold voltage shifts during negative gate bias stress in 4H-SiC MOSFETs, contributing significantly to the understanding of semiconductor materials and devices.
Articles (4)
The electric properties of the carbon dangling-bond (PbC) center at a thermally oxidized 4H-SiC(0001)/SiO2 interface are investigated. We experimentally and theoretically determine the energy levels of the associated interface states to estimate the impacts of the PbC center on power device operations. By combining electrically detected magnetic resonance spectroscopy and capacitance–voltage measurements, the two PbC electronic levels [(0/−) and (+/0)] are determined as ∼1.2 and 0.6 eV from the valence band maximum, respectively. The effective correlation energy of the PbC center is 0.6 eV, which is 1.5 times larger than that of the silicon dangling-bond (Pb) center at Si/SiO2 interfaces. Our first-principles calculations confirm that the electronic levels of PbC are similar to experimental values. Considering these energy levels, the PbC center must impact both p- and n-channel devices, which is closely related to previously reported channel features.
Year:
2023
Year:
2022
Year:
2021
Year:
2020
Collaborators (6)
Noriyuki Iwamuro
Professor
University of Tsukuba
Mitsuo Okamoto
National Institute of Advanced Industrial Science and Technology (AIST)
Hiroshi Yano
Associate Professor
University of Tsukuba
Tetsuo Hatakeyama
Professor
University of Toyama
Takahide Umeda
-
Mitsuru Sometani
National Institute of Advanced Industrial Science and Technology (AIST)
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