Dai Okamoto

Associate Professor

University of Toyama
Country flagJapan

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About

Dai Okamoto is an Associate Professor at Toyama Prefectural University in Japan. His research primarily focuses on the energy levels of carbon dangling-bond centers in silicon carbide interfaces, dipole scattering in silicon carbide MOSFETs, and the conduction mechanisms of oxide leakage currents. Recent publications include studies on threshold voltage shifts during negative gate bias stress in 4H-SiC MOSFETs, contributing significantly to the understanding of semiconductor materials and devices.

Articles (4)

The electric properties of the carbon dangling-bond (PbC) center at a thermally oxidized 4H-SiC(0001)/SiO2 interface are investigated. We experimentally and theoretically determine the energy levels of the associated interface states to estimate the impacts of the PbC center on power device operations. By combining electrically detected magnetic resonance spectroscopy and capacitance–voltage measurements, the two PbC electronic levels [(0/−) and (+/0)] are determined as ∼1.2 and 0.6 eV from the valence band maximum, respectively. The effective correlation energy of the PbC center is 0.6 eV, which is 1.5 times larger than that of the silicon dangling-bond (Pb) center at Si/SiO2 interfaces. Our first-principles calculations confirm that the electronic levels of PbC are similar to experimental values. Considering these energy levels, the PbC center must impact both p- and n-channel devices, which is closely related to previously reported channel features.

Year:

2023

Year:

2022

Year:

2021

Year:

2020

Collaborators (6)

Noriyuki Iwamuro

Professor

University of Tsukuba

JAPAN
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Mitsuo Okamoto

National Institute of Advanced Industrial Science and Technology (AIST)

JAPAN
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Hiroshi Yano

Associate Professor

University of Tsukuba

JAPAN
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Tetsuo Hatakeyama

Professor

University of Toyama

JAPAN
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Takahide Umeda

-

JAPAN
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Mitsuru Sometani

National Institute of Advanced Industrial Science and Technology (AIST)

JAPAN
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