Yukinori Morita

National Institute of Advanced Industrial Science and Technology (AIST)

Japan

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Articles (15)

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2025

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2025

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2025

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2025

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2024

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2023

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2023

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2022

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2022

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2021

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2021

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2021

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2021

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2021

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2020

Collaborators (12)

Takeshi Yoshimura

Associate Professor

Osaka University

JAPAN

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Hiroyuki Ota

Chief Senior Researcher

National Institute of Advanced Industrial Science and Technology (AIST)

JAPAN

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Keisuke Ohdaira

Professor

Japan Advanced Institute of Science and Technology

JAPAN

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Toshifumi Irisawa

National Institute of Advanced Industrial Science and Technology

JAPAN

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Norifumi Fujimura

Professor

Osaka University

JAPAN

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Kazuhiko Endo

Professor

Tohoku University

JAPAN

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Shinji Migita

National Institute of Advanced Industrial Science and Technology (AIST)

JAPAN

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Shota Nunomura

National Institute of Advanced Industrial Science and Technology

JAPAN

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Tatsuro Maeda

National Institute of Advanced Industrial Science and Technology (AIST)

JAPAN

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Kimihiko Kato

National Institute of Advanced Industrial Science and Technology (AIST)

JAPAN

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Shutaro Asanuma

National Institute of Advanced Industrial Science and Technology

JAPAN

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Moeta Tsukamoto

Assistant Professor

The Univeristy of Tokyo

JAPAN

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Yukinori Morita

Research Interests

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Articles (15)

Nanoscale direct patterning in ultrathin silicon nanosheets utilizing helium ion microscopy

Comprehensive analysis of determining factors of the effective work function of TiAlC/TiN metal gates for advanced gate-all-around CMOS integration

Correlative behavior between defect generation and ferroelectricity development in Hf0.5Zr0.5O2

Excess Oxygen Modulation Through Channel Thickness Scaling and Annealing Ambient for AlOx-Passivated Ultrathin InOx FETs

Development of ferroelectricity with crystallographic phase transformation in Hf0.5Zr0.5O2 thin films upon initial stimulation of an electric field exceeding the coercive field

Magnetic field imaging by hBN quantum sensor nanoarray

Defect generation and recovery in high-k HfO2/SiO2/Si stack fabrication

Enhancement of ferroelectricity in sputtered HZO thin films by catalytically generated atomic hydrogen treatment

Anomalous change of carrier transport property of ferroelectric Hf0.5Zr0.5O2 thin films in the first poling treatment

Investigation of the wake-up process and time-dependent imprint of Hf0.5Zr0.5O2 film through the direct piezoelectric response

Accelerated ferroelectric phase transformation in HfO<sub>2</sub>/ZrO<sub>2</sub> nanolaminates

Electron beam lithography with negative tone resist for highly integrated silicon quantum bits

Impact of reduced pressure crystallization on ferroelectric properties in hafnium-zirconium dioxide films deposited by sputtering

Thermal stability of ferroelectricity in hafnium–zirconium dioxide films deposited by sputtering and chemical solution deposition for oxide-channel ferroelectric-gate transistor applications

Source engineering for bilayer tunnel field-effect transistor with hetero tunnel junction: thickness and impurity concentration

Collaborators (12)

Takeshi Yoshimura

Hiroyuki Ota

Keisuke Ohdaira

Toshifumi Irisawa

Norifumi Fujimura

Kazuhiko Endo

Shinji Migita

Shota Nunomura

Tatsuro Maeda

Kimihiko Kato

Shutaro Asanuma

Moeta Tsukamoto

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