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Postdoctoral Appointee in Atomic Layer Deposition for X-ray Optics Fabrication Argonne National Laboratory in United States
Degree Level
Postdoc
Field of study
Chemistry
Funding
Full-time long-term fixed-term postdoctoral appointment with an expected hiring range of $72,879–$121,465. Comprehensive employee benefits are included; the final salary depends on qualifications, responsibilities, business considerations, internal equity, and market conditions.
Country
United States
University
Argonne National Laboratory
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About this position
Argonne National Laboratory in Lemont, Illinois, United States, is seeking a Postdoctoral Appointee in atomic layer deposition (ALD) for X-ray optics fabrication. The position is based in the X-ray Science Division’s Optics Group.
The postdoctoral researcher will develop and optimize ALD processes for depositing thick multilayer structures on flat and patterned substrates. Research will include characterization of film thickness, crystallinity, strain, and optical properties using X-ray diffraction, X-ray reflectometry, transmission X-ray microscopy, and electron microscopy.
Additional work involves specifying, designing, and commissioning ALD reactor systems; developing thin-film metrology methods; improving deposition accuracy during extended deposition campaigns; and testing diffractive optics at the 1-BM beamline and potentially other Advanced Photon Source beamlines. The researcher will collaborate with scientists in Argonne’s Center for Nanoscale Materials, Materials Science Division, and Applied Materials Division.
Applicants must hold a Ph.D. in Chemistry, Materials Science and Engineering, Chemical Engineering, Physics, or a closely related discipline completed within the past 0–5 years. Required experience includes ALD reactor operation, precursor chemistry or process development, thin-film characterization, and SEM or TEM structural analysis. Strong peer-reviewed publications, communication skills, and the ability to work independently and collaboratively are expected. Experience with ALD reaction kinetics, thin-film metrology, lithography, deep reactive-ion etching, or related nanofabrication is preferred.
This is a full-time, long-term fixed-term postdoctoral appointment. The expected hiring range is $72,879–$121,465, with comprehensive benefits.
Funding details
Full-time long-term fixed-term postdoctoral appointment with an expected hiring range of $72,879–$121,465. Comprehensive employee benefits are included; the final salary depends on qualifications, responsibilities, business considerations, internal equity, and market conditions.
What's required
Ph.D. in Chemistry, Materials Science and Engineering, Chemical Engineering, Physics, or a closely related field completed within the last 0–5 years. Applicants should have hands-on experience with atomic layer deposition reactor operation, precursor chemistry, or process development; experience with thin-film characterization such as ellipsometry, reflectometry, or microscopy; and SEM and/or TEM experience for structural analysis. A strong peer-reviewed publication record, good written and verbal communication skills, and the ability to work independently and collaboratively in a multidisciplinary research environment are required. Preferred qualifications include familiarity with ALD reaction kinetics and chemistry, thin-film metrology instrumentation, and nanofabrication techniques such as lithography or deep reactive-ion etching.
How to apply
Apply through the Argonne Careers Workday application page for requisition 423556. Review the position requirements and submit the requested application materials through the online portal.
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Make your next move.
Prepare your application
Review drafts and confirm requirements with the university.