Joachim Schnadt

Lund University

Sweden

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Articles (18)

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2025

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2025

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2025

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2025

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2024

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2024

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2024

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2024

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2023

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2023

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2022

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2022

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2022

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2022

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2022

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2022

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2022

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2021

Collaborators (13)

Heta-Elisa Nieminen

University of Helsinki

FINLAND

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Rainer Timm

Associate Professor

Lund University

SWEDEN

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Erik Lind

Professor

Lund University

SWEDEN

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Ville Miikkulainen

University lecturer

FINLAND

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François Rochet

Sorbonne Université

FRANCE

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Jean-Jacques Gallet

Sorbonne Université

FRANCE

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Simo Huotari

University of Helsinki

FINLAND

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Mikko Ari Ilmari Kaipio

University of Helsinki

FINLAND

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Matti Putkonen

University of Helsinki

FINLAND

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Samuli Urpelainen

Adjunct Professor

Oulun Yliopisto

FINLAND

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Giulio D'Acunto

Eindhoven University of Technology

NETHERLANDS

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Charlotte Platzer Björkman

SWEDEN

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Jens Uhlig

Assistant Professor

Lund University

SWEDEN

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Joachim Schnadt

Research Interests

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Articles (18)

In Situ Studies of Atomic Layer Deposition of Hafnium Oxide on (Ag,Cu)(In,Ga)Se2 for Thin Film Solar Cells

Time-resolved ambient pressure x-ray photoelectron spectroscopy: Advancing the operando study of ALD chemistry

Catalysis in Frequency Space

Resolving active species during the carbon monoxide oxidation over Pt(111) on the microsecond timescale

Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)

In Vacuo XPS Study on Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and N2/NH3 Plasma

Using Iron L-Edge and Nitrogen K-Edge X-ray Absorption Spectroscopy to Improve the Understanding of the Electronic Structure of Iron Carbene Complexes

Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

Time evolution of surface species during the ALD of high-k oxide on InAs

Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO2

Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research

Dip-and-pull ambient pressure photoelectron spectroscopy as a spectroelectrochemistry tool for probing molecular redox processes

Role of Temperature, Pressure, and Surface Oxygen Migration in the Initial Atomic Layer Deposition of HfO2 on Anatase TiO2(101)

Oxygen relocation during HfO2 ALD on InAs

AP-XPS Study of Ethanol Adsorption on Rutile TiO2(110)

Following the Kinetics of Undercover Catalysis with APXPS and the Role of Hydrogen as an Intercalation Promoter

Oxygen relocation during HfO2 ALD on InAs

Resonant X-ray photo-oxidation of light-harvesting iron (II/III) N-heterocyclic carbene complexes

Collaborators (13)

Heta-Elisa Nieminen

Rainer Timm

Erik Lind

Ville Miikkulainen

François Rochet

Jean-Jacques Gallet

Simo Huotari

Mikko Ari Ilmari Kaipio

Matti Putkonen

Samuli Urpelainen

Giulio D'Acunto

Charlotte Platzer Björkman

Jens Uhlig

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